Conveners
Session 1 - Nuclear Microprobe Technology 1
- Istvan Rajta (MTA Atomki)
Dr
Tomihiro Kamiya
(Japan Atomic Energy Agency (JAEA), Japan)
08/07/2014, 08:30
Invited Technical Oral Communication
R&Ds of ion microbeam technology have been progressed at TIARA facility since 1990. In order to expand the variety of ion beam applications of analysing, and fabricating mesoscopic scale system, we have been developing three different types of ion microbeam systems connecting to the 3-MV single-ended accelerator, 3-MV tandem and AVF-Cyclotron (K=110) [1]. For micro-analyses, other than the...
Prof.
Guanghua Du
(Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou, China)
08/07/2014, 09:00
Invited Technical Oral Communication
The high energy beam of tens to hundred MeV/n ions possesses mm-to-cm penetration depth in materials and can be easily extracted into air without significant energy loss and beam scattering. Combination of high energy ions and microbeam technology facilitates the microprobe application to many practical studies in large scale samples. The IMP heavy ion microbeam facility has recently...
Mr
Natko Skukan
(Rudjer Boskovic Institute, Zagreb, Croatia)
08/07/2014, 09:30
Invited Technical Oral Communication
In some external microbeam applications the knowledge of a precise number and timestamp of delivered ions is required. Among others, these include single event upsets, timing applications and investigation of radiation effects on living cells. Different triggering techniques have been developed to fulfill this requirement. In our approach, exit window acts as a trigger detector at the same...
Dr
Primoz Pelicon
(Jozef Stefan Institute, Jamova 39, SI-1000 Ljubljana, Slovenia)
08/07/2014, 10:00
Oral Communication
One of the key parameters influencing the performance of an ion microprobe is the brightness of the ion source. Traditionally, negative proton beams for injection in tandem accelerators are from von Ardenne type ion sources (duoplasmatrons). This type of ion source provides moderate normalized beam brightness of up to a value of 2 A m-2 rad-2 eV-1 [1,2], one order of magnitude lower compared...
Prof.
Jeroen Anton van Kan
(CIBA, Physics NUS, Singapore)
08/07/2014, 10:20
Oral Communication
In the recent past we have demonstrated the potential of proton beam writing (PBW) as a leading candidate for the next generation lithography technique [1,2]. We are now progressing towards sub-10 nm lithography in nuclear microprobe experiments. To achieve this goal, plans are being rolled out to improve the performance of existing low brightness (~15 – 70 A/m^2SrV) radio frequency (RF) ion...
