6–11 Jul 2014
Palazzo del Bo and Centro Culturale San Gaetano, Padova
Europe/Rome timezone

MeV ion beam mask lithography of parylene-C and parylene-F

10 Jul 2014, 08:30
30m
Auditorium (Centro Culturale San Gaetano, Padova)

Auditorium

Centro Culturale San Gaetano, Padova

Speaker

Prof. Harry J. Whitlow (University of Applied Sciences (HES-SO), Haute Ecole Arc Ingénierie, Institut des Microtechnologies Appliquées Arc, Switzerland)

Description

Lithographic patterning with 16O+ ions has been demonstrated by us, and others in polytetrafluoroethylene (PTFE). Motivated by the molecular level similarity of PTFE with parylene-C and parylene-F; we have investigated the possibility of using 0.6–2 MeV oxygen ions to pattern these polymers using aperture mask lithography for prosthetic applications in inner-ear surgery. Parylene-C and –F could be patterned in a similar way to that reported for PTFE. However, the removal per unit fluence for 1 MeV 16O+ was ~5% that for PTFE. Both films deposited on glass and silicon substrates and self-supporting films of Parylene-C could be patterned. We also investigated irradiation in a atmosphere of up to 10-3 mbar oxygen and observed any increase in removal rate for the polymers in question. Increasing the energy of the 16O+ beam from 600 keV to 2 MeV increased the removal rate of parylene-C ~1.5×. Biocompatibility tests using murin Spiral Ganglia cells (SG) showed that there was no significant difference in SG cell proliferation between irradiated and unirradiated areas. Moreover, laminin and poly-L-lysine applied after ion irradiation completely dominate the cell attachment.

Primary author

Prof. Harry J. Whitlow (University of Applied Sciences (HES-SO), Haute Ecole Arc Ingénierie, Institut des Microtechnologies Appliquées Arc, Switzerland)

Co-authors

Dr Alexandra Homsy (University of Applied Sciences, Haute Ecole Arc Ingénierie, (HES-SO), La Chaux-de-Fonds, Switzerland) Dr Edith Laux (University of Applied Sciences, Haute Ecole Arc Ingénierie, (HES-SO), La Chaux-de-Fonds, Switzerland) Mr Edouard Guibert (University of Applied Sciences, Haute Ecole Arc Ingénierie, (HES-SO), La Chaux-de-Fonds, Switzerland) Dr Gianni. Fiorucci (University of Applied Sciences, Haute Ecole Arc Ingénierie, (HES-SO), Neuchâtel, Switzerland) Prof. Herbert Keppner (University of Applied Sciences, Haute Ecole Arc Ingénierie, (HES-SO), La Chaux-de-Fonds, Switzerland) Dr Marta Roccio (Inner Ear Research Laboratory, Univ. Department of Otorhinolaryngology, Head and Neck Surgery, Inselspital, Bern, Switzerland) Mr Maxime Bergamin (University of Applied Sciences, Haute Ecole Arc Ingénierie, (HES-SO), La Chaux-de-Fonds, Switzerland) Prof. Pascal Senn (Inner Ear Research Laboratory, Univ. Department of Otorhinolaryngology, Head and Neck Surgery, Inselspital, Bern, Switzerland) Dr Patrick Jeanneret (University of Applied Sciences, Haute Ecole Arc Ingénierie, (HES-SO), La Chaux-de-Fonds, Switzerland) Dr Rattanaporn Norarat (Faculty of Science and Agriculture, Rajamangala University of Technology Lanna, Chiang Rai, Thailand)

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