Session

Session 1 - Fundamental understanding - General

20 Jun 2019, 09:00
Ferrara, Italy

Ferrara, Italy

Description

Chair: Eduard Llobet

Presentation materials

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  1. Dr Nicolae Barsan (Institute of Physical Chemistry, University of Tuebingen (ipc) )
    20/06/2019, 09:00
    Invited Talk

    Application runs the show: what can we learn about the future from the past?

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  2. Dr Ciftyurek Engin (Heinrich Heine University of Duesseldorf)
    20/06/2019, 09:30
    Oral

    Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in which high-quality, fine functional oxide films in the range of 10-1000 nm can be grown. The low deposition temperature and nonobligatory of heat treatment make it possible to obtain fine grains with high surface area. Despite the fact that few reports in recent years highlighted the importance of...

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  3. Dr Gemma G. Mandayo (Ceit-IK4)
    20/06/2019, 09:50
    Oral

    Introduction
    The performance of a metal oxide gas sensor can be affected by different parameters as the fabrication process of the sensitive layer or the post-annealing treatment. Nevertheless, not only the way the material has been obtained is relevant for the sensor performance. The conditions under which the detection is carried out are of great importance, namely the temperature of the...

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  4. Anton Koeck (Materials Center Leoben Forschung GmbH)
    20/06/2019, 10:10
    Oral

    Heterogeneous integration of metal oxides – towards a CMOS based multi gas sensor device

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  5. Prof. Kengo Shimanoe (Kyushu University)
    20/06/2019, 10:30
    Oral

    Consideration for oxygen adsorption species on SnO2 semiconductor gas sensors

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