21–27 Sept 2025
Hotel Hermitage, La Biodola Bay, Isola d'Elba, Italy
Europe/Rome timezone

The Ultracold Electron Source as an Injector for high bunch charge Dielectric Laser Acceleration

25 Sept 2025, 16:40
20m
Sala Biodola (Hotel Biodola)

Sala Biodola

Hotel Biodola

Oral contribution PS2: High gradient vacuum structures PS2: High gradient vacuum structures

Speaker

Ameya Patwardhan (Eindhoven University of Technology)

Description

The potential of Dielectric Laser Accelerators [1] is currently limited due to the low bunch charges typically achieved. This is because the small lateral sizes of the accelerating structures pose strict requirements on the injection beam. A bunched low emittance beam is thus required for reasonable injection efficiency. We propose a compact low-energy design of an electron injector based on the Ultracold Electron Source [2, 3] and a novel permanent magnet lens designed through genetic optimization. Simulations indicate a beam waist in the order of 1 um and bunch length of 1ps at a bunch charge of 1 fC can be attained without a linac. This can potentially increase the bunch charge of Dielectric Laser Accelerators by several orders of magnitude.

  1. R. Joel England et al., Dielectric laser accelerators, Rev. Mod. Phys. 86, 1337
  2. J. G. H. Franssen et al., Compact ultracold electron source based on a grating magneto-optical trap, Phys. Rev. Accel. Beams 22, 023401
  3. T. C. H. de Raadt et al., Subpicosecond Ultracold Electron Source, Phys. Rev. Lett. 130, 205001

Author

Ameya Patwardhan (Eindhoven University of Technology)

Co-authors

Simona Borrelli (TU/Eindhoven) Bas van der Geer (Eindhoven University of Technology) Jom Luiten Dr Julius Huijts (Eindhoven University of Technology)

Presentation materials