Speaker
Description
In this work, we present the principle, development, functionality, and characterization of a new type of photon detector. The technology of amorphous silicon Micro-channel plates (AMCPs) uses a versatile approach to stack hydrogenated amorphous silicon in thicknesses up to 100 um, using plasma-enhanced chemical vapor deposition and etch microchannels of diameter 2 um, every 4.5 um, on a hexagonal pattern, by deep reactive ion etching. Five generations of these devices have led to significant improvements in specifications. The versatile fabrication process allows etching of funnel-shaped channels, leading to an active area close to 100%. Measurements have shown excellent timing resolution (σ < 10 ps FWHM) for low incoming fluxes, along with a maximum single-channel gain around 1500, in reverse voltage of 500 V. The flexibility of the fabrication processes allows to grow the detector directly on top of a CMOS cascade of low-noise amplifiers with a spatial resolution of 15x15 um2, offering 400000 channels on chip.
Field | Detectors and electronics |
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