22–28 May 2016
Hotel Hermitage, La Biodola, Isola d'Elba
Europe/Rome timezone

Amorphous silicon as low loss, high refractive index material for dielectric mirror coatings

24 May 2016, 18:00
Hotel Hermitage, La Biodola, Isola d'Elba

Hotel Hermitage, La Biodola, Isola d'Elba

<a target="_blank" href=http://www.elba4star.it/en/hermitage-hotel>Hotel Hermitage</a>

Speaker

Mr Zeno Tornasi (University of Glasgow)

Description

The dielectric mirror coatings in aLIGO are made of alternating layers of silica and tantala. Such materials exhibit high mechanical loss at low temperature, therefore reducing the advantages of cooling as the primary solution to coating thermal noise. Amorphous silicon is a promising candidate as a replacement of tantala as high refractive index material in a Bragg stack. Having a refractive index higher than tantala, it allows for thinner layers, its low loss enables low thermal noise coatings. High optical absorption is the main limitation in exploiting aSi. We report on the characterisation of optical absorption and microscopic structure of amorphous silicon films.

Primary author

Mr Zeno Tornasi (University of Glasgow)

Co-authors

Dr Iain Martin (University of Glasgow) Mrs Jessica Steinlechner (University of Glasgow)

Presentation materials