23–28 Sept 2012
Alghero, Sardegna, Italy
Europe/Rome timezone

Energy Dependence of Angular Patterns of X-rays Generated by 20-35 MeV Rechanneling Electrons in Ultrathick Si Crystals

27 Sept 2012, 19:39
1m
Alghero, Sardegna, Italy

Alghero, Sardegna, Italy

Hotel Calabona
Poster Session PS2 Poster Sesion

Speaker

Dr Sergey Uglov (Tomsk Polytechnic University)

Description

In this work the energy dependences of the spots and bands in angular patterns of X-rays generated by 20-35 MeV rechanneling electrons in a 2 mm thick Si crystal are presented. It is shown that such a complicated “background” additional to ordinary bremsstrahlung must be taken into account at studying of X-ray generation in periodic structures created on crystalline substrates because in the some cases the X-rays from rechanneling electrons might be so intensive that could mask the effects defined by the periodic structures.

Primary author

Dr Valery Kaplin (Tomsk Polytechnic University)

Co-author

Dr Sergey Uglov (Tomsk Polytechnic University)

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