24–25 Oct 2019
Palazzo Moroni, Padova
Europe/Rome timezone

Dissipation in a Tantala film from 10K to 150K from thermal noise measurements

24 Oct 2019, 15:30
25m
Sala Paladini (Palazzo Moroni, Padova)

Sala Paladini

Palazzo Moroni, Padova

Speaker

Ludovic Bellon (Univ Lyon, ENS Lyon, UCBL, CNRS, Laboratoire de Physique (LPENSL))

Description

We study the dissipation φ of a silicon µ-cantilever coated with 300nm of Tantala. From the thermal noise spectra, a fit of 10 resonances for flexion modes, and 6 resonances for torsion modes can be performed, giving access to φ from 2 kHz to 600 kHz. Dissipation presents a weak maximum around 50 K in temperature, and is a slowly increasing function of frequency (power law $f^α$ with α~0.06). An extrapolation of this behaviour to lower frequencies (down to 10 Hz) agrees reasonably well with the thermal noise measurements, even if external noise peaks hinder direct exploitation of noise in this frequency range.

Primary authors

Richard Pedurand (Univ. Lyon, IN2P3/CNRS, Laboratoire des Matériaux Avancés (LMA) & Univ. Lyon, ENS Lyon, UCBL, CNRS, Laboratoire de Physique (LPENSL)) Ghaouti Hansali (LMA) Vincent Dolique (LMA, LPENSL) Alex Fontana (LPENSL) Lorenzo Mereni (LMA) David Hofman (LMA) Benoit Sassolas (LMA) Christophe Michel (LMA) Laurent Pinard (LMA) Julien Teillon (LMA) Massimo Granata (LMA) Jérôme Degallaix (LMA) Gianpietro Cagnoli (LMA & ILM-UCBL) Ludovic Bellon (Univ Lyon, ENS Lyon, UCBL, CNRS, Laboratoire de Physique (LPENSL))

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