Descrizione
Chair: Eduard Llobet
Application runs the show: what can we learn about the future from the past?
Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in which high-quality, fine functional oxide films in the range of 10-1000 nm can be grown. The low deposition temperature and nonobligatory of heat treatment make it possible to obtain fine grains with high surface area. Despite the fact that few reports in recent years highlighted the importance of...
Introduction
The performance of a metal oxide gas sensor can be affected by different parameters as the fabrication process of the sensitive layer or the post-annealing treatment. Nevertheless, not only the way the material has been obtained is relevant for the sensor performance. The conditions under which the detection is carried out are of great importance, namely the temperature of the...
Heterogeneous integration of metal oxides – towards a CMOS based multi gas sensor device
Consideration for oxygen adsorption species on SnO2 semiconductor gas sensors
